Photon-stimulated desorption from chlorinated Si(111): Etching of SiCl by picosecond-pulsed laser irradiation
نویسندگان
چکیده
Tomoyuki Kirimura,1,2,* Ken-ichi Shudo,1,2,† Yujiro Hayashi,2 Yoshihito Tanaka,2 Tetsuya Ishikawa,2 and Masatoshi Tanaka1 1Department of Physics, Faculty of Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya-ku, Yokohama 240-8501, Japan 2RIKEN SPring-8 Center, 1-1-1, Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5148, Japan Received 11 August 2005; revised manuscript received 26 October 2005; published 9 February 2006
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تاریخ انتشار 2006